| 摘要 |
A method of micropattern formation, comprising forming resist pattern (3) constituted of a chemical amplification type photoresist on substrate of 6 inches or more (1); applying onto the resist pattern (3) a micropattern formation material composed of a water soluble resin, a water soluble crosslinking agent and water or a mixed solvent of water and water soluble organic solvent so as to form coating layer (4); baking the chemical amplification type photoresist pattern and the coating layer; and developing the coating layer after baking to thereby form a miniaturized pattern, wherein a water soluble resin exhibiting, in DSC curve, a melting heat peak temperature which is higher than the baking temperature at the above baking step and exceeds 130°C is used as the water soluble resin of the micropattern formation material.
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