发明名称 |
Stencil mask having auxiliary and main struts and method for forming the same |
摘要 |
A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas. |
申请公布号 |
KR100555503(B1) |
申请公布日期 |
2006.03.03 |
申请号 |
KR20030042775 |
申请日期 |
2003.06.27 |
申请人 |
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发明人 |
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分类号 |
G03F1/00;G03F1/14;G03F1/16;G03F1/20;G03F9/00;H01L21/00;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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