Method for manufacturing phosphor, phosphor and plasma display panel

摘要

It is an object of the present invention to control damage of a phosphor caused by an etching solution. Disclosed is a method of manufacturing a phosphor having the steps of: (a) crushing phosphor particles via a crushing treatment process, and (b) surface-treating phosphor particles dispersed in a solvent by adding an etching solution via a surface treatment process, wherein an adding speed of the etching solution is in a range of 1.2x10^-16-7.0x10^-15 mol/min. per 1 m² of specific surface area of the phosphor particles.