发明名称 |
Method for manufacturing a pixel array of top emitting OLED |
摘要 |
A process for manufacturing a pixel array of top-emitting OLED pixel is provided. The process comprises: providing a substrate having at least two poly-silicon islands defined thereon, and defining an implantation region on the substrate; forming a gate insulator layer and a gate metal layer sequentially, and then defining a gate; carrying out an implantation process for forming the doped region; forming an inter-layer dielectric (ILD) layer and etching a plurality of contact holes thereon; forming a source/drain metal layer and defining a source/drain pattern thereon; wherein the patterned source/drain metal layer extends to the pixel array of the top-emitting OLED so as to be employed as a bottom electrode of the top-emitting OLED. The characteristic of the present invention is that the bottom electrode is substantially the portion of the source/drain extending to the pixel array of the top-emitting OLED, so that the array manufacturing can save at least two masks. |
申请公布号 |
US2006043373(A1) |
申请公布日期 |
2006.03.02 |
申请号 |
US20040984745 |
申请日期 |
2004.11.10 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
WU YUNG F.;CHENG CHUN C.;YEH YUNG H. |
分类号 |
H01L29/04;H01L21/00;H01L21/77;H01L27/32;H01L29/786;H01L51/52;H01L51/56;H05B33/10 |
主分类号 |
H01L29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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