POLYMERIZABLE MONOMER, POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESIST AND METHOD FOR PRODUCING SEMICONDUCTOR

摘要

Disclosed is a polymerizable monomer represented by the following formula (1): (1) (wherein R1, R 2 and R3 respectively represent a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group; W represents a single bond or a linking group; and n is 0 or 1. When n is 1, at least one of R 1, R2 and R3 is a fluorine atom or a fluoroalkyl group. A ring in the formula may have a substituent.) The polymerizable monomer can provide a polymer for photoresists with appropriate hydrophilicity, or appropriate hydrophilicity and transparency.