| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a double-sided polishing machine constantly realizing a nearly uniform polishing gap over the entire radius of a polishing face. <P>SOLUTION: The double-sided polishing machine has the following constitution. An upper surface-plate 10 and a lower surface-plate 12, which are respectively provided with a polishing plate 16 and a holding plate 14, are relatively rotationally driven around the same axis. The polishing gap for machining both surfaces of a flat workpiece is provided between the respective surface-plates. The double-sided polishing machine is provided with: a temperature control means at least for the upper surface-plate, which conveys a temperature-controlled fluid into the upper surface-plate 10 via a fluid passage 54; and an interval measuring device 40 which is incorporated into each surface-plate and measures a gap width of the polishing gap at least at two points of the polishing gap separated in the radial direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
