| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle frame capable of preventing a reduction in exposure area by preventing inward deflection of a frame caused by the tension of a pellicle membrane, and obtaining a pellicle having excellent dimensional precision and excellent affixing positional accuracy on a photo-mask, and a pellicle for photo-lithography using the frame. <P>SOLUTION: The frame has an outwardly projecting arc-shaped part in a center part, an outwardly recessed arc-shaped part on both sides, and a straight shaped part on its further outer sides at least on a pair of ridges of a frame body. The radius of the outwardly recessed arc-shaped part is preferably≥1/3 of the radius of the outwardly projecting arc-shaped part. The frame is effectively applicable of a large frame in which at least the length of a pair of ridges of the frame body is≥400 mm. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
