| 摘要 |
PROBLEM TO BE SOLVED: To prevent a film from being influenced by dust whirling up when a gas is introduced into a vacuum device. SOLUTION: This vacuum device has a vacuum vessel and a substrate holder arranged within the vessel and mounted with a substrate. The device also has an inlet or an outlet for the gas formed in the wall surface of the vessel on the back side of the to-be-treated surface of the substrate and a diffuser arranged between the back surface and the inlet or outlet. COPYRIGHT: (C)2006,JPO&NCIPI
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