发明名称 |
Film formation source, vacuum film formation apparatus, and method of manufacturing organic EL panel |
摘要 |
It is an object of the present invention to easily adjust the percentage of each component when mixing together several film formation materials, so as to prevent deviation among film formation areas. A film formation source of a vacuum film formation apparatus comprises: a plurality of material accommodating units containing a plurality of film formation materials; a plurality of heating means for heating the film formation materials contained within the material accommodating units; a plurality of discharge outlets for discharging atom flows or molecule flows of film formation materials; a plurality of discharge passages for air-tightly communicating the material accommodating units with discharge outlets. Two groups of discharge outlets each for discharging an identical film formation material are arranged in one direction, in a manner such that two elongated discharge areas formed by linearly connecting the outer edges of the discharge outlets are at least partially overlapped with each other when viewed from overhead.
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申请公布号 |
US2006045958(A1) |
申请公布日期 |
2006.03.02 |
申请号 |
US20050185788 |
申请日期 |
2005.07.21 |
申请人 |
ABIKO HIROSI;MASUDA DAISUKE;UMETSU SHIGEHIRO |
发明人 |
ABIKO HIROSI;MASUDA DAISUKE;UMETSU SHIGEHIRO |
分类号 |
B05D5/06;C23C16/00 |
主分类号 |
B05D5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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