发明名称 DISCHARGE-ENHANCED ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION
摘要 A discharge-enhanced CVD apparatus and method utilizes a nozzle containing electrodes to generate a high voltage electrical discharge at or near atmospheric pressure in the absence of a stabilizing or arc-suppressing noble gas. Reactants are passed directly through or/and under the discharge before being directed to the surface of a substrate to be coated.
申请公布号 WO2006022905(A2) 申请公布日期 2006.03.02
申请号 WO2005US14707 申请日期 2005.05.02
申请人 ARKEMA INC.;CULP, THOMAS, D.;KOROTKOV, ROMAN, Y.;GUPTA, RAVI, R. 发明人 CULP, THOMAS, D.;KOROTKOV, ROMAN, Y.;GUPTA, RAVI, R.
分类号 H05H1/24;C23C16/00 主分类号 H05H1/24
代理机构 代理人
主权项
地址