DISCHARGE-ENHANCED ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION
摘要
A discharge-enhanced CVD apparatus and method utilizes a nozzle containing electrodes to generate a high voltage electrical discharge at or near atmospheric pressure in the absence of a stabilizing or arc-suppressing noble gas. Reactants are passed directly through or/and under the discharge before being directed to the surface of a substrate to be coated.
申请公布号
WO2006022905(A2)
申请公布日期
2006.03.02
申请号
WO2005US14707
申请日期
2005.05.02
申请人
ARKEMA INC.;CULP, THOMAS, D.;KOROTKOV, ROMAN, Y.;GUPTA, RAVI, R.
发明人
CULP, THOMAS, D.;KOROTKOV, ROMAN, Y.;GUPTA, RAVI, R.