发明名称 NONVOLATILE MEMORY ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a nonvolatile memory element, exhibiting stabilized operational characteristics with low power consumption in which Ion/Ioff is high and variations thereof is small over a large number of operation times. <P>SOLUTION: The nonvolatile memory element comprises a lower electrode 21 composed of a conductive substance, a dielectric layer 22 formed on the lower electrode 21, a voltage control layer 23 formed on the dielectric layer 22 and containing an antiferromagnetic substance, and an upper electrode 24 formed on the voltage control layer 23 and composed of a conductive substance. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006060232(A) 申请公布日期 2006.03.02
申请号 JP20050239536 申请日期 2005.08.22
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI SHOKEN;PARK YOUNG-SOO
分类号 H01L27/10;G11C11/22 主分类号 H01L27/10
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