发明名称 Semiconductor device and method for manufacturing the same
摘要 A semiconductor device includes a gate electrode formed on a semiconductor layer, source and drain layers formed in the semiconductor layer and disposed on both sides of the gate electrode, and a field plate disposed at the back of the semiconductor layer with an insulating layer provided therebetween.
申请公布号 US2006046393(A1) 申请公布日期 2006.03.02
申请号 US20050212519 申请日期 2005.08.25
申请人 SEIKO EPSON CORPORATION 发明人 KATO JURI
分类号 H01L21/336 主分类号 H01L21/336
代理机构 代理人
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