| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generating device capable of forming a plasma with uniform distribution over a large area, and a plasma processing device equipped with the same. <P>SOLUTION: The plasma generating device is composed of a plasma generating chamber 60 capable of maintaining an atmosphere with a pressure lower than atmospheric pressure, a ring-shaped resonator 10 making travelling microwave resonate, a plurality of jointing devices 42 distributing microwave from the ring-shaped resonator 10, and a plurality of applicators 50 connected to the plurality of jointing devices 42 respectively, guiding the microwave into the plasma generating chamber 60. Plasma is generated by the microwave guided from the plurality of applicators 50 into the plasma generating chamber 60. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
