| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspection method of a substrate pattern that uses a statistical deduction function. <P>SOLUTION: An light signal group and a pattern characteristic group are generated, and the statistical deduction function between the light signal group and the pattern characteristic group is created, by saving the light signal data corresponding to each reference pattern formed on a plurality of reference substrates and pattern characteristic data related to the reference pattern. An inspected substrate, formed with an inspected pattern, is irradiated with an inspection light, and signal data of the inspection light reflected from the inspected pattern is generated. A pattern characteristic value related to the inspected pattern is deduced, by using the signal data of the inspection light and the statistical deduction function. The deduced pattern characteristic value is inspected as to whether it lies within the tolerance. The light signal data and the actual measured pattern characteristic data related to the pattern out of the tolerance are saved as the light signal group and the pattern characteristic group, and the statistical deduction function is updated. The pattern can be inspected inexpensively and rapidly. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
