发明名称 System, method, and apparatus for ion beam etching process stability using a reference for time scaling subsequent steps
摘要 A system for improving drift compensation for ion mill applications defines a reference step for purposes of time duration. The reference step is controlled by an end point detector and monitored for use with subsequent process steps. The time duration for a subsequent step is adjusted as a percentage of the reference step. A time scaling factor determines the actual duration of the subsequent step. Rather than directly using times of step duration, the system uses a percentage of the reference step for the latter step. The duration of the reference step varies depending on the tool drift. The overall duration is changed in the same proportion as the duration of the reference step, and thereby compensates for the influence of drift on the end product.
申请公布号 US2006043280(A1) 申请公布日期 2006.03.02
申请号 US20040930277 申请日期 2004.08.30
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. 发明人 FELDBAUM MICHAEL;GUTHRIE HUNG-CHIN;JAYASEKARA WIPUL P.;PENTEK ARON
分类号 B01D59/44 主分类号 B01D59/44
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