| 发明名称 |
Silicon cleaning method for semiconductor materials and polycrystalline silicon chunk |
| 摘要 |
A cleaning method cleans silicon for semiconductor materials using pure water treated by a reverse osmosis treatment and by ion exchange treatment and reduces the aluminum and iron remaining on the silicon surface.
|
| 申请公布号 |
US2006042539(A1) |
申请公布日期 |
2006.03.02 |
| 申请号 |
US20040928682 |
申请日期 |
2004.08.26 |
| 申请人 |
MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION |
发明人 |
OHTA HIROTAKE |
| 分类号 |
C30B15/00;C30B21/06;C30B27/02;C30B28/10;C30B30/04 |
主分类号 |
C30B15/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
