发明名称 |
PLASMA COATING SYSTEM FOR COATING OF SUBSTRATES |
摘要 |
A plasma coating system includes at least one coating station with a first side and a second side defining a pathway with at least one bend. The coating station also includes a first plasma arc that provides a plasma jet directed towards a substrate. The first plasma arc is positioned on either the first side or the second side of the bend. |
申请公布号 |
WO2006022779(A1) |
申请公布日期 |
2006.03.02 |
申请号 |
WO2004US35576 |
申请日期 |
2004.10.27 |
申请人 |
EXATEC, LLC;GASWORTH, STEVEN, M. |
发明人 |
GASWORTH, STEVEN, M. |
分类号 |
B05D7/24;B29C59/14;C23C4/12;C23C16/04 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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