PUPIL IMPROVEMENT OF INCOHERENT IMAGING SYSTEMS FOR ENHANCED CD LINEARITY
摘要
A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
申请公布号
WO2006021406(A2)
申请公布日期
2006.03.02
申请号
WO2005EP09056
申请日期
2005.08.22
申请人
MICRONIC LASER SYSTEMS AB;SANDSTROEM, TORBJOERN;IVONIN, IGOR