发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTROOPTICAL DEVICE AND METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electrooptical device with which a substrate for an electrooptical device equipped with a light reflection film having appropriate light scattering property and light directivity is easily and accurately obtained by a simple manufacturing step, and also provide a method for manufacturing an electrooptical device. <P>SOLUTION: The method for manufacturing a substrate for an electrooptical device is characterized by providing a resin layer where a recessed and projecting pattern is formed so that divided shape having an assumed center line orthogonal to a prescribed direction where a developer is supplied as a boundary may be asymmetric on the substrate for the electrooptical device and further forming the light reflection film on the resin layer. The method for an electrooptical device utilizes such a substrate for the electrooptical device. The methods include a step for forming the resin layer by laminating photosensitive material on the substrate for the electrooptical device, a step for performing pattern exposure to the resin layer through a photomask, a step for forming the recessed and projecting pattern while supplying the developer to the resin layer from the prescribed direction, and a step for forming the light reflection film on the resin layer having the recessed and projecting pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006058334(A) 申请公布日期 2006.03.02
申请号 JP20040237078 申请日期 2004.08.17
申请人 SEIKO EPSON CORP 发明人 OTAKE TOSHIHIRO
分类号 G02B5/08;G02B5/02;G02F1/1333;G02F1/1335 主分类号 G02B5/08
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