| 摘要 |
<P>PROBLEM TO BE SOLVED: To effectively and efficiently evaluate distortions in a scan field or translational error, in a projection system. <P>SOLUTION: A reticle, consisting of the planar array of standard overlay targets, is transferred onto a silicon wafer coated with a photoresist several times through exposure by using a photolithographic scanner. Then, by using a conventional overlay measuring tool, positional errors of the overlay target are measured. The data on the overlay error obtained as the measuring result are transferred to a software program, wherein the contribution of the lens is obtained with respect to the error-in-the-field map of the photolithographic projection scanning system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
