METHOD AND APPARATUS OF ANGULAR-RESOLVED SPECTROSCOPIC LITHOGRAPHY CHARACTERIZATION

摘要

PROBLEM TO BE SOLVED: To provide a method of measuring overlay and trellis-shape parameter using lithography technology and angle-resolved spectrum measurement in a pupil plane of a high numerical aperture of lens during a manufacture of a device.

SOLUTION: Apparatus and the method which determine a property of a substrate by measuring an angle-resolved spectrum as a result of radiation being reflected by the substrate in the pupil plane of a high numerical aperture of lens. The property is dependent on angle and wavelength, and includes the intensity of TM- and TE-polarized light, and their relative phase difference.

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