| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method and the like by which high-precision exposing processing can be carried out without decreasing throughput. <P>SOLUTION: In the process of search measurement which is carried out during an interval base line check, the range of a measurement scope on the image surface of a CCD camera 23 is limited and a search is carried out in the limited measurement scope and the position of a mark RM7 for search on a reticle R is measured. Then fine measurement is carried out. In the process of the fine measurement, the image of a pattern RM1 for position measurement identical with that for fine measurement for obtaining reference data which are carried out during the base line check at the time of a lot start and an image of a reference mark FM1 are used and their relative positions are detected. After that, an amount of a difference with respect to the reference data is calculated by comparing the result of measurement with the reference data. If the amount of the difference exeeds a predetermined range, a reticle stage RS is driven by a reticle stage driving system 12 for adjusting the relative position between the reticle R (an area PA on which patterns are formed) and a wafer w. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
