发明名称 SUBSTRATE POSITIONING MECHANISM, SUBSTRATE POSITIONING METHOD, SUBSTRATE CARRYING APPARATUS AND IMAGE FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate positioning mechanism and a substrate positioning method by which the position of a substrate in the width direction and the carrying direction can be detected by a simple structure, and to provide a substrate carrying apparatus equipped with the substrate positioning mechanism, and an image recording apparatus equipped with the substrate carrying apparatus. <P>SOLUTION: A top end positioning unit 50 having a plurality of positioning sensors mounted along the width direction is disposed in the downstream side of a carrying support roller 16. The moving distance (measured value) in the width direction is detected by the movement of an elevating stage 28 in the width direction. If a substrate material 200 is inclined with respect to the carrying direction, the top end positioning unit 50 is retreated to the downstream side of the carrying direction so as to generate a time difference in the detection state of the substrate material 200, which tells the inclination amount. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006058783(A) 申请公布日期 2006.03.02
申请号 JP20040242704 申请日期 2004.08.23
申请人 FUJI PHOTO FILM CO LTD 发明人 KOIZUMI TAKASHI
分类号 G03F7/20;H05K3/00 主分类号 G03F7/20
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