| 摘要 |
A uniform flow control system for processing equipment with a plurality of work pieces located within the processing equipment, including a gas circulating device that circulates gas, a work chamber that can accommodate the plurality of work pieces and an expansion chamber that is located outside the work chamber and that guides gas to the work chamber. The expansion chamber includes a first chamber that extends along a first surface of the work chamber, a second chamber that extends along a second surface of the work chamber to a side of the first chamber, and a third chamber that extends from an end of the first chamber that is opposite the gas circulating device and below an end of the second chamber that is opposite the gas circulating device.
|
