发明名称 Bitline structure and method for production thereof
摘要 The invention relates to a bit line structure having a surface bit line (DLx) and a buried bit line (SLx), the buried bit line (SLx) being formed in a trench with a trench insulation layer ( 6 ) and being connected to doping regions ( 10 ) with which contact is to be made via a covering connecting layer ( 12 ) and a self-aligning terminal layer ( 13 ) in an upper partial region of the trench.
申请公布号 US2006043420(A1) 申请公布日期 2006.03.02
申请号 US20050513163 申请日期 2005.07.22
申请人 INFINEON TECHNOLOGIES AG 发明人 KAKOSCHKE RONALD;SHUM DANNY;TEMPEL GEORG
分类号 H01L27/10;H01L21/28;H01L21/336;H01L21/8247;H01L27/115 主分类号 H01L27/10
代理机构 代理人
主权项
地址