| 摘要 |
Provided is an apparatus for coating a photoresist on a substrate. The photoresist coating apparatus includes a nozzle, a discharge unit, and a foreign substance barrier. The nozzle coats a photoresist on the substrate. The discharge unit is formed in a body with a lower portion of the nozzle and discharges a photoresist. The foreign substance barrier is formed at a front lower portion of the nozzle and protects the discharge unit from a foreign substance on the substrate.
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