发明名称 SOUND DETECTING MECHANISM AND PROCESS FOR MANUFACTURING THE SAME
摘要 <p>A sound detecting mechanism is provided which forms a diaphragm with a required thickness and yet restraining distortion of the diaphragm to provide high sensitivity. The sound detecting mechanism comprises a pair of electrodes forming a capacitor on a substrate A in which one of the electrodes is a back electrode C forming perforations Ca therein corresponding to acoustic holes and the other of the electrodes is a diaphragm B. A silicon nitride film 303 is provided on the side adjacent a base of the substrate A with respect to a membrane acting as the diaphragm B formed on the substrate A.</p>
申请公布号 EP1631116(A1) 申请公布日期 2006.03.01
申请号 EP20040745300 申请日期 2004.05.25
申请人 HOSIDEN CORPORATION;TOKYO ELECTRON LIMITED 发明人 OHBAYASHI, YOSHIAKI;YASUDA, MAMORU;SAEKI, SHINICHI;KOMAI, MASATSUGU;KAGAWA, KENICHI
分类号 H04R19/00;H01L29/84;H04R19/01;(IPC1-7):H04R19/01 主分类号 H04R19/00
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