发明名称 |
Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
摘要 |
<p>A method for designing an illumination light source, includes acquiring a control feature to control a dimension of a transferred pattern of a mask pattern; designating a plurality of illumination elements illuminating the mask pattern; designating first illumination lights to each of first polarization states of a light emitted from each of the illumination elements; calculating a first optical image of the control feature, formed on a first imaging plane by each of the first illumination lights; and determining an illumination shape and a polarization state distribution of the light, based on an optical characteristic of the first optical image.</p> |
申请公布号 |
EP1630614(A1) |
申请公布日期 |
2006.03.01 |
申请号 |
EP20050018261 |
申请日期 |
2005.08.23 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
FUKUHARA, KAZUYA |
分类号 |
G03F7/20;G03F1/36;G03F1/68;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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