| 发明名称 |
Apparatus and method for transferring a pattern |
| 摘要 |
<p>A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.
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| 申请公布号 |
EP1605308(A8) |
申请公布日期 |
2006.03.01 |
| 申请号 |
EP20050012232 |
申请日期 |
2005.06.07 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KAWAKAMI, EIGO;OTA, HIROHISA;NAKAMURA, TAKASHI;KASUMI, KAZUYUKI;TOKITA, TOSHINOBU |
| 分类号 |
G03F7/20;G03F7/00;H01L21/027;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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