| 摘要 |
<p>A protective film-forming composition capable of forming a protective film soluble in an alkali developer on a resist film, that is, a protective film which in the pattern formation by immersion exposure, protects the resist film from the immersion liquid, undergoes no swelling with the immersion liquid, is removable with an alkali developer used in the developing step and allows for formation of a good pattern, and an immersion exposure pattern forming method using the composition, are provided, which are a protective film-forming composition for immersion exposure, comprising a water-insoluble alkalisoluble resin having an acid value of 2.0 to 8.0 milli-equivalent/g; and a pattern forming method using the composition.</p> |
