发明名称 |
Illumination system for electron beam lithography tool |
摘要 |
<p>A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical "fly's eye" lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
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申请公布号 |
EP1091386(A3) |
申请公布日期 |
2006.03.01 |
申请号 |
EP20000308685 |
申请日期 |
2000.10.03 |
申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
KATSAP, VICTOR;KRUIT, PETER;MOONEN, DANIEL;WASKIEWICZ, WARREN KAZMIR |
分类号 |
G21K5/04;H01J37/065;G03F7/20;H01J37/12;H01J37/30;H01J37/305;H01J37/317;H01L21/027 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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