Adjustable resolution interferometric lithography system

摘要

A lithographic system includes a laser outputting a laser beam (106); a beamsplitter (103) dividing the laser beam into a plurality of beams (107); and a prism (101) for forming interference fringes on a substrate (104) using the plurality of beams. Resolution of the lithographic system is adjustable without replacing any optical components in an optical path of the lithographic system. The beamsplitter is movable along the optical path (102) to adjust the resolution. The prism includes a plurality of sets of facets (105), each set of facets corresponding to a particular resolution. Each set of facets corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. The resolution is adjustable. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.