发明名称 |
Submerged processing device for photosensitive material |
摘要 |
A submerged processing device for a photosensitive material disposed at a partitioning wall which is provided within a processing tank main body and which is between processing chambers respectively storing a processing liquid, the submerged processing device includes: a housing at an interior of which is formed a processing space where the processing liquid is stored; a conveying path for conveying-in of the photosensitive material and which is formed in the housing so as to communicate with an interior of the processing space; a path for conveying-out of the photosensitive material and which is formed in the housing so as to communicate with the interior of the processing space; a processing liquid passage preventing mechanism disposed at the photosensitive material conveying path such that only the photosensitive material passes therethrough; and a processing liquid changing mechanism provided at the housing, for changing the processing liquid stored in the processing space.
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申请公布号 |
US7004651(B2) |
申请公布日期 |
2006.02.28 |
申请号 |
US20040807394 |
申请日期 |
2004.03.24 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TANAKA KATSUHIKO;MOGI FUMIO |
分类号 |
G03D3/08;G03D3/13 |
主分类号 |
G03D3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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