发明名称 Submerged processing device for photosensitive material
摘要 A submerged processing device for a photosensitive material disposed at a partitioning wall which is provided within a processing tank main body and which is between processing chambers respectively storing a processing liquid, the submerged processing device includes: a housing at an interior of which is formed a processing space where the processing liquid is stored; a conveying path for conveying-in of the photosensitive material and which is formed in the housing so as to communicate with an interior of the processing space; a path for conveying-out of the photosensitive material and which is formed in the housing so as to communicate with the interior of the processing space; a processing liquid passage preventing mechanism disposed at the photosensitive material conveying path such that only the photosensitive material passes therethrough; and a processing liquid changing mechanism provided at the housing, for changing the processing liquid stored in the processing space.
申请公布号 US7004651(B2) 申请公布日期 2006.02.28
申请号 US20040807394 申请日期 2004.03.24
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TANAKA KATSUHIKO;MOGI FUMIO
分类号 G03D3/08;G03D3/13 主分类号 G03D3/08
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