| 摘要 |
<p>The invention relates to a photoinsubilisable composition based on styrene-diene-styrene type copolymer comprising 50 ... 95 parts of a copolymer wherein the diene block may be polyisoprene or polybutadiene, 5 .... 30 parts of acrylic monomers, 0.1...10 parts of benzophenone and Michler's ketone mixture, 0.1 ... 1 parts of paramethoxy phenol, 0.1 ... 1 parts of 4,4'-thio-bis(6-tert-buthyl-3methyl phenol) and 0.1 ... 1 parts of sodium or potassium periodate. The photosensitive plate is obtained by adhering the photoactive layer resulting by treating the composition onto a metal or polyester support.</p> |
