Lithographic apparatus an apparatus comprising an illumination system an apparatus comprising a projection system an optical element for a lithographic apparatus and device manufacturing method,申请号SG20050004355-传众专利搜索

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发明名称	Lithographic apparatus an apparatus comprising an illumination system an apparatus comprising a projection system an optical element for a lithographic apparatus and device manufacturing method
摘要
申请公布号	SG119304(A1)	申请公布日期	2006.02.28
申请号	SG20050004355	申请日期	2005.07.11
申请人	ASML NETHERLANDS B.V.	发明人	WILHELMUS JOSEPHUS BOX
分类号		主分类号
代理机构		代理人
主权项
地址

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