发明名称 |
CMP systems and methods utilizing amine-containing polymers |
摘要 |
The invention provides a chemical-mechanical polishing system and method comprising a liquid carrier, a polishing pad and/or an abrasive, and at least one amine-containing polymer, wherein the amine-containing polymer has about 5 or more sequential atoms separating the nitrogen atoms of the amino functional groups or is a block copolymer with at least one polymer block comprising one or more amine functional groups and at least one polymer block not comprising any amine functional groups.
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申请公布号 |
US7004819(B2) |
申请公布日期 |
2006.02.28 |
申请号 |
US20020051241 |
申请日期 |
2002.01.18 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
MOEGGENBORG KEVIN J.;CHERIAN ISAAC K.;BRUSIC VLASTA |
分类号 |
B24B7/22;B24B37/00;C09G1/02;C09K3/14;H01L21/304 |
主分类号 |
B24B7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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