发明名称 |
Vapor deposition of solid oligomers |
摘要 |
A monomer is selected to produce a polymeric film having desirable characteristics for a particular application. The monomer is ppolymerized under controlled conditions to produce a solid oligomer having those characteristics at a molecular weight suitable for evaporation under vacuum at a temperature lower than its thermal decomposition temperature. The process of polymerization to produce the oligomer is carried out under conditions that yield a finite molecular-chain length with no residual reactive groups. The solid oligomer so produced is extruded as a film onto a revolving drum ( 38 ) in the evaporation section ( 40 ) of a vapor deposition chamber, and then cryocondensed on a cold substrate ( 44 ) to form a solid film having the same characteristic selected in the solid oligomer constituting the starting material. As a result of the initial complete reaction to produce the oligomer, the thin-film product does not contain unreacted groups and all attendant disadvantages are avoided.
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申请公布号 |
US7005161(B2) |
申请公布日期 |
2006.02.28 |
申请号 |
US20030475923 |
申请日期 |
2003.10.24 |
申请人 |
SIGMA LABORATORIES OF ARIZONA, INC. |
发明人 |
MIKHAEL MICHAEL G.;YIALIZIS ANGELO |
分类号 |
C23C14/24;C23C14/00;C23C14/12 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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