发明名称 Vapor deposition of solid oligomers
摘要 A monomer is selected to produce a polymeric film having desirable characteristics for a particular application. The monomer is ppolymerized under controlled conditions to produce a solid oligomer having those characteristics at a molecular weight suitable for evaporation under vacuum at a temperature lower than its thermal decomposition temperature. The process of polymerization to produce the oligomer is carried out under conditions that yield a finite molecular-chain length with no residual reactive groups. The solid oligomer so produced is extruded as a film onto a revolving drum ( 38 ) in the evaporation section ( 40 ) of a vapor deposition chamber, and then cryocondensed on a cold substrate ( 44 ) to form a solid film having the same characteristic selected in the solid oligomer constituting the starting material. As a result of the initial complete reaction to produce the oligomer, the thin-film product does not contain unreacted groups and all attendant disadvantages are avoided.
申请公布号 US7005161(B2) 申请公布日期 2006.02.28
申请号 US20030475923 申请日期 2003.10.24
申请人 SIGMA LABORATORIES OF ARIZONA, INC. 发明人 MIKHAEL MICHAEL G.;YIALIZIS ANGELO
分类号 C23C14/24;C23C14/00;C23C14/12 主分类号 C23C14/24
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