发明名称 Radiation generating device lithographic apparatusdevice manufacturing method and device manufactur ed thereby
摘要 A device for generating radiation based on a discharge includes a cathode (33k) and an anode (33a). The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles (31) may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories (33) of the material may be elongated. A laser (37) may be used to cause the discharge more easily. The laser may be directed on the anode or cathode or on a separate material located in between the anode and cathode.
申请公布号 SG119308(A1) 申请公布日期 2006.02.28
申请号 SG20050004388 申请日期 2005.07.08
申请人 ASML NETHERLANDS B.V. 发明人 KONSTANTIN NIKOLAEVITCH KOSHELEV;VLADIMIR VITALEVITCH IVANOV;EVGENII DMITREEVITCH KOROB;GIVI GEORGIEVITCH ZUKAVISHVILI;ROBERT RAFILEVITCH GAYAZOV;VLADIMIR MIHAILOVITCH KRIVTSUN
分类号 H05G2/00 主分类号 H05G2/00
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