发明名称 |
Radiation generating device lithographic apparatusdevice manufacturing method and device manufactur ed thereby |
摘要 |
A device for generating radiation based on a discharge includes a cathode (33k) and an anode (33a). The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles (31) may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories (33) of the material may be elongated. A laser (37) may be used to cause the discharge more easily. The laser may be directed on the anode or cathode or on a separate material located in between the anode and cathode.
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申请公布号 |
SG119308(A1) |
申请公布日期 |
2006.02.28 |
申请号 |
SG20050004388 |
申请日期 |
2005.07.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KONSTANTIN NIKOLAEVITCH KOSHELEV;VLADIMIR VITALEVITCH IVANOV;EVGENII DMITREEVITCH KOROB;GIVI GEORGIEVITCH ZUKAVISHVILI;ROBERT RAFILEVITCH GAYAZOV;VLADIMIR MIHAILOVITCH KRIVTSUN |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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