| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which suppresses sticking of particles to a substrate by controlling a relative distance between a lid of a housing container and a stage which holds the substrate during raising. SOLUTION: The apparatus is provided with: a stage 50 which holds the substrate G; a substrate vertically-moving means 51 for driving the stage 50 in a vertically movable manner; a lower chamber 53 housing the stage 50 and the substrate G and having an opening part 52 at its upper part 52; an upper chamber 54 for opening and closing the upper opening part 52 of the lower chamber 53; and a lid vertically-moving means 55 for driving the upper chamber 54 in a vertically movable manner. A driving means 60A of the substrate vertically-moving means 51 and a driving means 60B of the lid vertically-moving means 55 are formed separately and are operated simultaneously based on a control signal from a CPU 70 being a control means or simultaneously after one of the vertically-moving means operates vertically, and the relative distance between the lid and the substrate holding means can be controlled. COPYRIGHT: (C)2006,JPO&NCIPI |
