发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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申请公布号 |
US2006038968(A1) |
申请公布日期 |
2006.02.23 |
申请号 |
US20040921348 |
申请日期 |
2004.08.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KEMPER NICOLAAS R.;MARIE COX HENRIKUS H.;DONDERS SJOERD NICOLAAS L.;GRAAF ROELOF FREDERICK DE;HOOGENDAM CHRISTIAAN ALEXANDER;KATE NICOLAAS T.;MERTENS JEROEN JOHANNES SOPHIA M.;DER MEULEN FRITS V.;HERMAN MARIA TEUNISSEN FRANCISCUS J.;VAN DER TOORN JAN-GERARD C.;VERHAGEN MARTINUS CORNELIS M.;BELFROID STEFAN P.C.;SMEULERS JOHANNES P.M. |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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地址 |
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