| 摘要 |
PURPOSE: A hot plate apparatus having a vacuum buffer chamber is provided to prevent a wafer from being contaminated by contaminants and to improve reliability of an annealing process, by preventing a hot plate chamber from being exposed to the atmosphere while the wafer is transferred. CONSTITUTION: The annealing process is performed in the hot plate chamber(100). The vacuum buffer chamber(200) transfers the wafer to the hot plate chamber in a vacuum state. The annealed wafer is cooled in the vacuum buffer chamber. A transfer unit transfers the wafer to the vacuum buffer chamber in the atmosphere.
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