PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE PHOSPHOR PASTE COMPOSITION AND PROCESS FOR FORMING PHOSPHOR MEMBRANE BY USING THE SAME

摘要

PURPOSE: Provided are a photopolymerization type photosensitive phosphor paste composition used for forming a phosphor membrane of a plasma display panel and a process for forming the phosphor membrane by using the composition. CONSTITUTION: The photopolymerization type photosensitive phosphor paste composition comprises 100pts.wt. of a cellulose-based aqueous binder polymer, 100pts.wt. of a multi-functional monomer or oligomer, 20pts.wt. of a photo-initiator, 300pts.wt. of a phosphor, 150-550pts.wt. of a solvent capable of dissolving the cellulose-based aqueous binder polymer, and 0.1-5pts.wt. of an agent for controlling photo-reaction velocity. And the phosphor membrane is formed by a process comprising the steps of: (a) forming a first phosphor membrane by spreading the photopolymerization type photosensitive phosphor paste composition on a glass substrate, heating and drying at 100-140deg.C for 10-30 minutes, arranging a mask and exposing for 20-60 seconds, and developing the exposed membrane by using pure water; (b) forming a second phosphor membrane by using the composition containing a phosphor having a different color from the phosphor of the step(a) and the same method as the first step(a); (c) forming a third phosphor membrane by using the composition containing a phosphor having a different color from the phosphors of the first and second steps(a)(b) and the same method as the first step(a); and calcining the substrate with the phosphor membranes at 450-550deg.C.