| 摘要 |
A self-aligned image sensor and a method for fabricating the same is disclosed, that decrease production cost and reduce or prevent misalignment between a micro-lens and a color filter. A protection layer having a flat upper surface is formed on a semiconductor substrate that includes image sensor elements, such as photodiodes, therein. A color filter is then formed on the protection layer, and then a micro-lens is formed in, on or from the color filter by reflowing the color filter material, so that the color filter and the micro-lens are self-aligned.
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