DEVICE FOR MULTIPLE ELECTRON BEAM DRAWING EQUIPMENT AND MANUFACTURING METHOD OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a deflection device for a multiple electron beam drawing equipment capable of forming through-holes of a high aspect ratio having a deflection electrode with high precision and high density. SOLUTION: The manufacturing method of the deflection device for the multiple electron beam drawing equipment forms deflection electrodes for deflecting electron beams on side walls of through-holes 2 after forming a plurality of the through-holes 2 on a silicon substrate 1. By the manufacturing method, a groove part 11 having an almost vertical side wall is formed by dry-etching the silicon substrate 1 from its one side; a second hole part 2b with an almost vertical side wall, having a diameter different from that of the groove part, is formed so as to communicate with the groove part 11 by dry-etching from the other side of the silicon substrate 1; and opposing deflection electrodes independent from each other are formed on the side walls of the through-holes 2, after forming the through-holes 2 having an aspect ratio of not less than 4 penetrating through the silicon substrate together with the first hole part 2a formed by the groove part 11. COPYRIGHT: (C)2006,JPO&NCIPI