| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of determining exposure conditions by which a substrate can be satisfactorily exposed in desired projecting states when pattern images are projected through liquid, an exposure method of exposing the substrate on the exposure conditions determined by the determination method, and an exposure device capable of satisfactorily exposing the substrate in the desired projecting states when the pattern images are projected through the liquid. <P>SOLUTION: In advance of an exposure of the substrate, pattern images are projected one by one through a projection optical system under plural conditions of the liquid, and there are determined exposure conditions at the time when the pattern images are projected on the substrate based on the projecting states of the pattern images. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
