Method to produce thin film resistor with no resistor head using dry etch

摘要

A method of fabricating a thin film resistor ( 100 ) without a hardmask or resistor head. The resistor material ( 104 ), e.g., NiCr, is deposited. The resistor material ( 104 ) is patterned and sputter etched to form the resistor body without first depositing a hardmask material. For example, a sputter etch chemistry comprising BCl₃, Cl₂, and Ar may be used to etch the resistor material.