| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a developer for a thermal recording material which shows higher than the same level of excellent color developing sensitivity and resistance to water, oil and light as the counterpart using bisphenol A as a raw material, and a method for manufacturing this developer. <P>SOLUTION: This developer for a thermal recording material is composed of a chemical compound shown in formula [1] (wherein, R<SB>1</SB>is one selected from the group consisting of hydrogen, a 1-4C alkyl group, a 5-7C cycloalkyl group, a phenyl group, an aralkyl group, an alkoxy group and a halogen atom; n is a integer of 1 to 4; R<SB>2</SB>is one selected from the group consisting of hydrogen, hydroxyl, a 1-4C alkyl group, a 5-7C cycloalkyl group, a phenyl group, an aralkyl group, an alkoxy group and a halogen atom; and m is an integer of 1 to 4). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
