发明名称 METHOD FOR MANUFACTURING HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL MANUFACTURED BY THE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a heat developable photosensitive material having excellent coated surface conditions and less fog, and a heat developable photosensitive material manufactured by the method. SOLUTION: In the method for manufacturing the heat developable photosensitive material having, on at least one surface of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder and a non-photosensitive layer, (1) the non-photosensitive organic silver salt is dispersed by at least one dispersant selected from polyacrylamides and derivatives thereof and a mass ratio of the non-photosensitive organic silver salt to the dispersant is 15-100, (2) a silver behenate content of the non-photosensitive organic silver salt is 91-99 mol%, and (3)≥50 mass% of the binder is a hydrophilic binder. The heat developable photosensitive material manufactured by the method is also provided. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006053488(A) 申请公布日期 2006.02.23
申请号 JP20040236768 申请日期 2004.08.16
申请人 FUJI PHOTO FILM CO LTD 发明人 OYAMADA TAKAYOSHI
分类号 G03C1/498;G03C1/76 主分类号 G03C1/498
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