COMPOSITION FOR FORMING TANTALUM OXIDE FILM, TANTALUM OXIDE FILM, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a tantalum oxide film capable of easily and efficiently forming a high quality tantalum oxide film having a large specific dielectric constant and a less leak current and being preservable for a long time under an atmospheric condition at a high humidity, a tantalum oxide film formed thereby, and its manufacturing method. SOLUTION: The composition for forming the tantalum oxide film contains a reaction product prepared from tantalum alkoxide and at least one or more kinds among carboxylic acids and carboxylic acid anhydrides and a solvent. The tantalum oxide film is formed by forming a coating film of the composition and then treating it with heat and/or light. COPYRIGHT: (C)2005,JPO&NCIPI