发明名称 |
SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS |
摘要 |
Compositions and methods employing supercritical fluids, e.g., supercritical carbon dioxide, for removal of unwanted material from microelectronic device structures and process equipment. One composition of such type, having utility for removing flux and solder perform surface films, includes supercritical fluid, e.g., supercritical CO2, and organic co-solvent, e.g., xylene. Another composition of such type having utility for removal of metals, metal oxides, metal-containing post-etch residues and CMP particles from semiconductor substrates includes supercritical fluid and at least one beta-diketone. |
申请公布号 |
EP1627429(A2) |
申请公布日期 |
2006.02.22 |
申请号 |
EP20040751238 |
申请日期 |
2004.05.04 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
ROEDER, JEFFREY F.;BAUM, THOMAS, H.;HEALY, MATTHEW;XU, CHONGYING |
分类号 |
B08B3/00;B08B3/04;C11D1/00;C11D3/02;C11D3/16;C11D3/18;C11D3/20;C11D3/24;C11D3/28;C11D3/43;C11D7/02;C11D7/24;C11D7/26;C11D7/28;C11D7/32;C11D7/50;C11D11/00;D06L1/00;G03F7/42 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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